Katsuji Tabara
at Fujitsu Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Data compression, Data modeling, Data storage, Data processing, Photomasks, Logic devices, Optical proximity correction, Data conversion, Binary data, Instrument modeling

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