Katsumi Nishimura
Team Leader at HORIBA Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Semiconductors, Lithography, Optical lithography, Contamination, Air contamination, Ions, Gases, Photomasks, Chromatography, Absorption

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Lithography, FT-IR spectroscopy, Optical lithography, Ions, Spatial light modulators, Microsoft Foundation Class Library, Semiconducting wafers, Chromatography, Absorption

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