Katsumi Ohira
at SELETE
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 19, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Inspection, Photomasks, Image transmission, Laser optics, Optical inspection, Lithography, Defect detection, Sensors, Objectives, Image sensors

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Inspection, Photomasks, Sensors, Image sensors, Defect detection, Algorithm development, Speckle, Modulation transfer functions, Image processing, Optical inspection

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Inspection, Optical proximity correction, Lithography, Optical lithography, Resolution enhancement technologies, Defect detection, Defect inspection, SRAF, Optical inspection

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Computer simulations, Image processing, Image quality, Classification systems, Defect inspection, Resolution enhancement technologies, Deep ultraviolet

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Photomasks, Inspection, Lithography, Optical proximity correction, SRAF, Defect inspection, Optical lithography, Optical inspection, Defect detection, Resolution enhancement technologies

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Inspection, Photomasks, Lithography, Optical proximity correction, Deep ultraviolet, Semiconducting wafers, Binary data, Phase shifts, Chromium, Point spread functions

Showing 5 of 7 publications
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