Katsumi Ohira
at SELETE
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 19, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Optical inspection, Image sensors, Objectives, Image transmission, Photomasks, Laser optics

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Defect detection, Speckle, Sensors, Image processing, Inspection, Optical inspection, Image sensors, Photomasks, Modulation transfer functions, Algorithm development

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Defect detection, Inspection, Optical inspection, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies, Defect inspection

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Deep ultraviolet, Image processing, Inspection, Computer simulations, Image quality, Photomasks, Semiconducting wafers, Resolution enhancement technologies, Classification systems, Defect inspection

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Optical lithography, Defect detection, Inspection, Optical inspection, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies, Defect inspection

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Point spread functions, Deep ultraviolet, Inspection, Chromium, Photomasks, Optical proximity correction, Semiconducting wafers, Binary data, Phase shifts

Showing 5 of 7 publications
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