Katsumi Ohmori
General Manager at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (23)

Proceedings Article | 13 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Oxides, Carbon, Optical lithography, Etching, Polymers, Silicon, Scanning electron microscopy, Silicon carbide, Reactive ion etching, System on a chip

Proceedings Article | 1 April 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Thin films, Lithography, Optical lithography, Etching, Dry etching, Polymers, Annealing, Silicon, Nitrogen, Manufacturing, Control systems, Scanning electron microscopy, Directed self assembly

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Polymers, Electrons, Diffusion, Quantum efficiency, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Polymers, Diffusion, Quantum efficiency, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Polymer thin films, Chemically amplified resists

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Polymers, Image processing, Annealing, Error analysis, Coating, Materials processing, Manufacturing, Directed self assembly, Critical dimension metrology

Proceedings Article | 13 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Polymers, Diffusion, Quantum efficiency, Ionization, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double positive medium, Chemically amplified resists

Showing 5 of 23 publications
Conference Committee Involvement (2)
Advances in Patterning Materials and Processes XXXIII
29 February 2016 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXII
24 February 2015 | San Jose, California, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top