Dr. Katsumi Setoguchi
at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Metrology, Contamination, Image resolution, Time metrology, Precision measurement, Process control, Critical dimension metrology, Semiconducting wafers, Data corrections

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Statistical analysis, Detection and tracking algorithms, Calibration, Image processing, Distortion, Scanning electron microscopy, Process control, Semiconducting wafers, Beam analyzers, Ridge detection

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