Dr. Katsumi Setoguchi
at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 29 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Image processing, Error analysis, Scanning electron microscopy, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Metrology, Contamination, Image resolution, Time metrology, Precision measurement, Process control, Critical dimension metrology, Semiconducting wafers, Data corrections

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Statistical analysis, Detection and tracking algorithms, Calibration, Image processing, Distortion, Scanning electron microscopy, Process control, Semiconducting wafers, Beam analyzers, Ridge detection

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