Katsushi Makino
at Nikon Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Reticles, Photomasks, Scanners, Critical dimension metrology, Semiconducting wafers, Lithography, Electroluminescence, Error analysis, Distortion, Data modeling

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Distortion, Semiconducting wafers, Source mask optimization, Reticles, Overlay metrology, Scanners, Metrology, Lithography, Optical alignment, Motion models

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical alignment, System on a chip, Lithography, Semiconducting wafers, Image processing, Optical lithography, Scanning electron microscopy, Scanners, Signal processing, Photoresist processing

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Double patterning technology, Optical alignment, Distortion, Semiconducting wafers, Overlay metrology, Reticles, Scanners, Cooling systems, Lithography, Semiconductor manufacturing

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Optical alignment, Double patterning technology, Scanners, Lithography, Overlay metrology, Optical lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium, Etching

Showing 5 of 6 publications
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