Dr. Katsushi Nakano
at Nikon Corp
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Polymers, Scanners, Particles, Manufacturing, Inspection, Bridges, Immersion lithography, Fluorine, Photoresist processing, Semiconducting wafers

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Atrial fibrillation, Polymers, Particles, Inspection, Scanning electron microscopy, Printing, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Scanners, Particles, Materials processing, Manufacturing, Inspection, Immersion lithography, Photoresist processing, Semiconducting wafers, Liquids

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Contamination, Particles, Silicon, Manufacturing, Inspection, Scanning electron microscopy, Immersion lithography, Head-mounted displays, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Contamination, Particles, Coating, Process control, Image filtering, Bridges, Immersion lithography, High volume manufacturing, Thin film coatings, Semiconducting wafers

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Scanners, Particles, Coating, Scanning electron microscopy, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Showing 5 of 17 publications
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