Dr. Kaushal S. Patel
at IBM Microelectronics Div
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Polymers, Silicon, Reflectivity, Photoresist materials, Silicon films, Reactive ion etching

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Data modeling, Etching, Chemical species, Polymers, Oxygen, Photoresist materials, Photomasks, Reactive ion etching, Fluorine, Photoresist developing

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Refractive index, Antireflective coatings, Polymers, Reflectivity, Transmittance, Critical dimension metrology, Fluorine, Semiconducting wafers, Destructive interference, 193nm lithography

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Reticles, Cadmium, Etching, Control systems, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Particles, Materials processing, Photoresist materials, Immersion lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Modulation, Etching, Polymers, Photoresist materials, Photomasks, Immersion lithography, Reactive ion etching, Fluorine, 193nm lithography

Showing 5 of 9 publications
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