Dr. Kaushal D. Vora
at Australian National Univ
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | September 21, 2017
Proc. SPIE. 10343, Metamaterials, Metadevices, and Metasystems 2017
KEYWORDS: Plasmonics, Nanostructures, Second-harmonic generation, Signal attenuation, Glasses, Resistance, Nonlinear optics, Harmonic generation, Frequency conversion, Group III-V semiconductors

PROCEEDINGS ARTICLE | August 15, 2017
Proc. SPIE. 10228, Nonlinear Optics and Applications X
KEYWORDS: Second-harmonic generation, Scattering, Dielectrics, Resistance, Laser scattering, Nonlinear optics, Frequency conversion, Group III-V semiconductors, Nanolithography, Dielectric polarization

PROCEEDINGS ARTICLE | September 26, 2013
Proc. SPIE. 8816, Nanoengineering: Fabrication, Properties, Optics, and Devices X
KEYWORDS: Gold, Nanostructures, Electron beam lithography, Etching, Dry etching, Metals, Gallium arsenide, Silicon, Photomasks, Nanolithography

SPIE Journal Paper | January 1, 2007
JM3 Vol. 6 Issue 01
KEYWORDS: Diffusion, Photomasks, X-rays, X-ray lithography, Lithography, Polymethylmethacrylate, Synchrotron radiation, Photoresist processing, Photoresist materials, Diffraction

SPIE Journal Paper | January 1, 2007
JM3 Vol. 6 Issue 01
KEYWORDS: Acoustics, Diffusion, X-rays, Photomasks, X-ray lithography, Calibration, Temperature metrology, Resistance, Signal attenuation, Synchrotron radiation

PROCEEDINGS ARTICLE | December 21, 2005
Proc. SPIE. 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV
KEYWORDS: Lithography, Diffraction, Polymethylmethacrylate, X-rays, Diffusion, Photoresist materials, Photomasks, Synchrotron radiation, Photoresist processing, X-ray lithography

Showing 5 of 7 publications
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