Dr. Kaushik A. Kumar
at Tokyo Electron Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (12)

PROCEEDINGS ARTICLE | April 17, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Carbon, Lithography, Etching, Chemistry, Scanning electron microscopy, Photoresist materials, Line width roughness, Plasma enhanced chemical vapor deposition, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Diffractive optical elements, Etching, Image processing, Atomic layer deposition, Deposition processes, Critical dimension metrology, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Actuators, Optical lithography, Contamination, Etching, Scanners, Copper, Scanning electron microscopy, Semiconducting wafers, Overlay metrology, Tin

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Optical lithography, Etching, Ecosystems, Process control, Extreme ultraviolet, Line width roughness, Plasma etching, Line edge roughness, Photoresist processing, Plasma

PROCEEDINGS ARTICLE | April 7, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Amorphous silicon, Semiconductors, Lithography, Optical lithography, Silica, Etching, Metals, Coating, Materials processing, Photomasks, Extreme ultraviolet, Double patterning technology, High volume manufacturing, System on a chip, Standards development, Tin

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Optical lithography, Etching, Metals, Photoresist materials, Extreme ultraviolet lithography, Photoresist processing, System on a chip, Plasma, Tin

Showing 5 of 12 publications
Conference Committee Involvement (1)
Advanced Etch Technology for Nanopatterning VIII
25 February 2019 | San Jose, California, United States
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