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Kaushik Vemareddy
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Publications (1)
Proceedings Article | 6 April 2015 Paper
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
Proceedings Volume 9422, 94221D (2015) https://doi.org/10.1117/12.2085958
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Defect detection, Scanning electron microscopy, Extreme ultraviolet lithography, Defect inspection, Opacity, Extreme ultraviolet, Image classification
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