Kaustuve Bhattacharyya
Senior Director of Technology at ASML Netherlands BV
SPIE Involvement:
Author
Publications (53)

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Diffraction, Metrology, Detection and tracking algorithms, Polarization, Silicon, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Electronics, Metrology, Optical lithography, Polarization, Calibration, Etching, Optical testing, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Etching, Scanners, Control systems, Source mask optimization, Optical proximity correction, Optical alignment, Semiconducting wafers, Stochastic processes, Overlay metrology

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Target detection, Diffraction, Metrology, Switching, Sensors, Etching, Scanning electron microscopy, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 20 March 2019 Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Metrology, Logic, Sensors, Scanners, Distortion, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Lithographic process control

Showing 5 of 53 publications
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