Kaustuve Bhattacharyya
Technical Director at ASML Netherlands BV
SPIE Involvement:
Author
Publications (51)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Etching, Scanners, Control systems, Source mask optimization, Optical proximity correction, Optical alignment, Semiconducting wafers, Stochastic processes, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Target detection, Diffraction, Metrology, Switching, Sensors, Etching, Scanning electron microscopy, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Metrology, Logic, Sensors, Scanners, Distortion, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Lithographic process control

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Metrology, Spatial frequencies, Deconvolution, Optical alignment, Neodymium, Semiconducting wafers, Wafer testing, Performance modeling, Overlay metrology

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Metrology, Data modeling, Computing systems, Physics, Optical alignment, Semiconducting wafers, Nanofabrication, Overlay metrology, Instrument modeling

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Polarization, Etching, Physics, Scanning electron microscopy, Monte Carlo methods, Signal processing, Semiconductor manufacturing, Semiconducting wafers, Overlay metrology

Showing 5 of 51 publications
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