Dr. Kaveri Jain
Senior Engineer at Micron Technology Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 25 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Electronics, Optical lithography, Etching, Dry etching, Image processing, Materials processing, Photoresist materials, Atomic layer deposition, Plasma etching, Photomicroscopy, Thin film coatings, Semiconducting wafers, Photoresist developing, Plasma

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Reticles, Contamination, Cadmium, Manufacturing, Imaging devices, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Testing and analysis, Chemically amplified resists

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Etching, Image processing, Reflectivity, Scanning electron microscopy, Printing, Double patterning technology, Chemical reactions, Photoresist processing, Plasma treatment, Plasma

Proceedings Article | 4 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Polymers, Sulfur, Nitrogen, Surface roughness, Atomic force microscopy, Profiling, Immersion lithography, Fluorine, Semiconducting wafers, Polymer thin films

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Reticles, Optical lithography, Polymers, Molecules, Diffusion, Photoresist materials, Critical dimension metrology, Fluorine, Photoresist processing, Semiconducting wafers

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