Mr. Kazuhiko Mishima Profile

Kazuhiko Mishima

at Canon Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 23 March 2020 Presentation + Paper

Through-the-mask (TTM) optical alignment for high volume manufacturing nanoimprint lithography systems

Takamitsu Komaki, Yasuyuki Unno, Takahiro Matsumoto, Toshiki Iwai, Nozomu Hayashi, Tomokazu Taki, Tohru Kawashima, Satoshi Iino, Shinichirou Hirai, Ken Minoda, Takafumi Miyaharu, Kazuhiro Takahashi, Kazuhiko Mishima

Proceedings Volume 11327, 113270Y (2020) https://doi.org/10.1117/12.2551980

KEYWORDS: Optical alignment, Semiconducting wafers, Photomasks, Nanoimprint lithography, Overlay metrology, Error analysis, Wafer testing, Diffraction, High volume manufacturing, Distortion

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Proceedings Article | 21 March 2017 Presentation + Paper

Nanoimprint system development for high-volume semiconductor manufacturing the and status of overlay performance

Yukio Takabayashi, Mitsuru Hiura, Hiroshi Morohoshi, Nobuhiro Kodachi, Tatsuya Hayashi, Atsushi Kimura, Takahiro Yoshida, Kazuhiko Mishima, Yoshio Suzaki, Jin Choi

Proceedings Volume 10144, 1014405 (2017) https://doi.org/10.1117/12.2258385

KEYWORDS: Photomasks, Nanoimprint lithography, Semiconducting wafers, Optical alignment, Distortion, Overlay metrology, Semiconductor manufacturing, Lithography, Semiconductors, Particles, Actuators, Source mask optimization

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Proceedings Article | 26 March 2007 Paper

A study of overlay mark robustness and enhanced alignment techniques for alignment improvement on metal layers of sub-100-nm technology

Kaushalia Dubey, Toru Nakamura, Hiroshi Tanaka, Nozomu Hayashi, Shinichi Egashira, Kazuhiko Mishima, Tomohiro Mase, Tamio Takeuchi, Akihiko Honda, Takatoshi Kakizaki

Proceedings Volume 6520, 652033 (2007) https://doi.org/10.1117/12.711324

KEYWORDS: Optical alignment, Semiconducting wafers, Chemical mechanical planarization, Coating, Metals, Overlay metrology, Reflectivity, Scanners, Oxides, Light sources

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Proceedings Article | 26 March 2007 Paper

New projection optics and aberration control system for the 45-nm node

Toshiyuki Yoshihara, Bunsuke Takeshita, Atsushi Shigenobu, Yasuo Hasegawa, Yoshinori Ohsaki, Kazuhiko Mishima, Seiya Miura

Proceedings Volume 6520, 652022 (2007) https://doi.org/10.1117/12.711375

KEYWORDS: Projection systems, Monochromatic aberrations, Wavefront aberrations, Control systems, Sensors, Aberration correction, Optics manufacturing, Metrology, Lithography, Optical properties

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Proceedings Article | 7 July 1997 Paper

Alignment sensor corrections for tool-induced shift (TIS)

Tsuneo Kanda, Kazuhiko Mishima, Eiichi Murakami, Hideki Ina

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276005

KEYWORDS: Optical alignment, Sensors, Sensor calibration, Overlay metrology, Semiconductors, Semiconductor manufacturing, Semiconducting wafers

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SPIE Journal Paper | 1 September 1994

Frequency control of a laser diode by a photothermal effect and its application to frequency stabilization

Seiichi Kakuma, Kazuhiko Mishima, Ryoji Ohba

OE, Vol. 33, Issue 09, (September 1994) https://doi.org/10.1117/12.10.1117/12.177521

KEYWORDS: Modulation, Frequency modulation, Semiconductor lasers, Laser stabilization, Photothermal effect, Fermium, Temperature metrology, Fabry–Perot interferometers, Beam controllers, Solids

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Showing 5 of 6 publications

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