Kazuhiko Mishima
at Canon Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 21 March 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Semiconductors, Actuators, Lithography, Particles, Distortion, Photomasks, Semiconductor manufacturing, Source mask optimization, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Monochromatic aberrations, Aberration correction, Metrology, Optical properties, Sensors, Wavefront aberrations, Control systems, Projection systems, Optics manufacturing

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Oxides, Light sources, Metals, Scanners, Coating, Reflectivity, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 7 July 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Semiconductors, Sensors, Semiconductor manufacturing, Optical alignment, Sensor calibration, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 1 September 1994
OE Vol. 33 Issue 09
KEYWORDS: Modulation, Frequency modulation, Semiconductor lasers, Laser stabilization, Photothermal effect, Fermium, Temperature metrology, Fabry–Perot interferometers, Beam controllers, Solids

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