Kazuhiko Takahashi
at Fujitsu Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Optical lithography, Feature extraction, Neural networks, Machine learning, Image classification, Optical proximity correction, Raster graphics, Optics manufacturing

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Optical filters, Reticles, Image processing, Photography, Inspection, Scanning electron microscopy, Image filtering, Optical simulations, Critical dimension metrology, Optics manufacturing

PROCEEDINGS ARTICLE | August 1, 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Optical filters, Image processing, Manufacturing, Fourier transforms, Gaussian filters, Image filtering, Photomasks, Optical simulations, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | July 19, 2000
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Lithography, Logic, Data processing, Photomasks, Logic devices, Optical proximity correction, Critical dimension metrology, Data conversion, X-ray technology, Laser systems engineering

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