Kazuhiro Takahata
at Toshiba Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Data modeling, Process control, Finite element methods, Critical dimension metrology, Reactive ion etching, Optimization (mathematics), Photoresist processing, Failure analysis

Proceedings Article | 5 April 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Lithography, Visualization, Image processing, Pattern recognition, Silicon, Feature extraction, Photomasks, Computer aided design, Intelligence systems, Graphic design

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Logic, Optical lithography, Copper, Diffusion, Photomasks, Line width roughness, Logic devices, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Lithographic illumination, Metals, Scanners, Photomasks, Logic devices, SRAF, Binary data

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Logic, Optical lithography, Metals, Immersion lithography, Logic devices, Optical proximity correction, SRAF, Resolution enhancement technologies

Showing 5 of 9 publications
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