Dr. Kazuhisa Hasumi
at Hitachi High-Tech Science Corp
SPIE Involvement:
Publications (8)

SPIE Journal Paper | 13 June 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Overlay metrology, Scanning electron microscopy, Metrology, Semiconducting wafers, Etching, Selenium, Signal detection, Edge detection, Manufacturing, Scanners

SPIE Journal Paper | 4 April 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Inspection, Scanning electron microscopy, Capacitance, Resistance, Nanowires, Field effect transistors, Silicon, Transmission electron microscopy, Selenium, Semiconducting wafers

SPIE Journal Paper | 15 June 2018
JM3 Vol. 17 Issue 02
KEYWORDS: Semiconducting wafers, Oxides, Transmission electron microscopy, Etching, Thin films, Ellipsometry, Electron microscopes, Wafer testing, Edge detection, Thin film devices

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Resistance, Inspection, Scanning electron microscopy, Transmission electron microscopy, Capacitance, Field effect transistors, Semiconducting wafers, Nanowires

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Edge detection, Metrology, Statistical analysis, Calibration, Etching, Reliability, Resistance, Magnetism, Electron microscopes, Process control, Critical dimension metrology, Semiconducting wafers, Lawrencium

Showing 5 of 8 publications
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