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Kazuhisa Ishii
Manager at Nissan Chemical Corp
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Publications (1)
Proceedings Article | 24 August 2001 Paper
Development of 193-nm organic BARC
Takahiro Kishioka, Shinya Arase, Kazuhisa Ishii, Kenichi Mizusawa, Hiroyoshi Fukuro
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436914
KEYWORDS: Photoresist materials, Etching, Lithography, Polymers, Semiconducting wafers, Reflectivity, Silicon, Photoresist developing, Bottom antireflective coatings, Optical lithography
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