Kazuhisa Ogawa
at Sony Atsugi Technology Ctr
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 14 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Metals, Image processing, Error analysis, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Failure analysis, Yield improvement

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Semiconductors, Lithography, Statistical analysis, Ions, Manufacturing, Distortion, Transistors, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Semiconductors, Lithography, Image processing, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, SRAF, Model-based design, Resolution enhancement technologies

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Ions, Distortion, Design for manufacturing, Photomasks, Transistors, Optical proximity correction, Semiconducting wafers, Device simulation, Design for manufacturability

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Semiconductors, Lithography, Metals, Scanners, Printing, Design for manufacturing, Photomasks, Optical proximity correction, SRAF, Design for manufacturability

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top