Kazuki Hagihara
Specialist at Kioxia Holdings Corp
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Author
Publications (9)

Proceedings Article | 29 January 2020
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Optical lithography, Etching, Quartz, Inspection, Scanning electron microscopy, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 19 April 2019
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Nanostructures, Diffraction, Scattering, Quartz, X-rays, Scanning electron microscopy, Transmission electron microscopy, Time metrology, Nanoimprint lithography, X-ray detectors

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Nanostructures, 3D acquisition, Scattering, Quartz, Ultraviolet radiation, X-rays, Scanning electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Nanostructures, Scattering, Quartz, X-rays, 3D modeling, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Image processing, Scanning electron microscopy, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Vestigial sideband modulation

Showing 5 of 9 publications
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