Dr. Kazumasa Okamoto
Assistant Professor at Hokkaido Univ
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Chemical species, Polymers, Ions, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical reactions, Radiation effects, Fluorine, Absorption

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Electron beams, Polymers, Molecules, Hydrogen, Oxygen, Extreme ultraviolet, Scientific research, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Chromium, Solids, Ionization, Extreme ultraviolet, Photoresist processing, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Argon, Polymers, Electrons, Ions, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Free electron lasers, Protactinium, Absorption

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Oscillators, Polymethylmethacrylate, Polymers, Ionization, Extreme ultraviolet, Picosecond phenomena, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Electron beams, FT-IR spectroscopy, Polymers, Chromium, Solids, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

Showing 5 of 12 publications
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