Dr. Kazumasa Okamoto
Assistant Professor at Institute of Scientific and Industrial Research
SPIE Involvement:
Publications (17)

Proceedings Article | 9 April 2024 Poster + Paper
Proceedings Volume 12957, 129572F (2024) https://doi.org/10.1117/12.3025195
KEYWORDS: Extreme ultraviolet lithography, Lithography, Metals, Annealing, Extreme ultraviolet, Etching, Reactive ion etching, Particles, Miniaturization, Design

Proceedings Article | 22 February 2021 Poster + Presentation
Proceedings Volume 11612, 116120Y (2021) https://doi.org/10.1117/12.2584016
KEYWORDS: Chromium, Electron beam lithography, Photomasks, Silicon, Semiconducting wafers, Line width roughness, Glasses, Electron beams, Quartz, Lithography

Proceedings Article | 20 September 2020 Presentation
Proceedings Volume 11518, 115180D (2020) https://doi.org/10.1117/12.2574963
KEYWORDS: Line width roughness, Electron beam lithography, Chemically amplified resists, Photomasks, Electron beams, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Electronic components

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11326, 113260D (2020) https://doi.org/10.1117/12.2551865
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Electron beam lithography, Polymers, Lithography, Line width roughness, FT-IR spectroscopy, Ionization

Proceedings Article | 23 March 2020 Presentation + Paper
Y. Ikari, K. Okamoto, N. Maeda, A. Konda, T. Kozawa, T. Tamura
Proceedings Volume 11326, 113260G (2020) https://doi.org/10.1117/12.2551825
KEYWORDS: Polymers, Monte Carlo methods, Absorption, Chemically amplified resists, Photomasks, Temperature metrology, Ions, Lithography, Image processing, Semiconductors

Showing 5 of 17 publications
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