Kazumasa Takeshi
Semiconductor Research Lab at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Quartz, Polymers, Crystals, Mask making, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Vestigial sideband modulation, Chemically amplified resists

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Semiconductors, Optical lithography, Diffusion, Scanning electron microscopy, Photomasks, Mask making, Critical dimension metrology, Charged-particle lithography, Vestigial sideband modulation, Chemically amplified resists

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Polymers, Coating, Chromium, Printing, Chemical analysis, Mask making, Structural design, Fluorine, Chemically amplified resists

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Polymers, Chromium, Photomasks, Chemical analysis, Mask making, Critical dimension metrology, Chemically amplified resists

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