Dr. Kazumitsu Nakamura
Senior Researcher/Eng. at Hitachi High-Technologies Taiwan Corp
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Reticles, Manufacturing, Computing systems, Control systems, LCDs, Computer aided design, Data conversion, Semiconducting wafers, Optics manufacturing, Edge roughness

PROCEEDINGS ARTICLE | August 1, 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Light sources, Reticles, Opacity, Polarizers, LCDs, Projection systems, Transmittance, Semiconducting wafers, LCD projection

PROCEEDINGS ARTICLE | December 27, 1996
Proc. SPIE. 2884, 16th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Wafer-level optics, Oxides, Lithography, Electron beam lithography, Etching, Silicon, Photomasks, Plasma etching, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | May 27, 1996
Proc. SPIE. 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
KEYWORDS: Oxides, Lithography, Electron beam lithography, Etching, Silicon, Photomasks, Optical alignment, Photoresist processing, Plasma, Chemically amplified resists

PROCEEDINGS ARTICLE | December 8, 1995
Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Electron beam lithography, Metrology, Gallium arsenide, Inspection, Chromium, Atomic force microscopy, Quantum dots, Scanning electron microscopy, Photomasks, Nanofabrication

PROCEEDINGS ARTICLE | December 8, 1995
Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Lithography, Electron beam lithography, Roads, Control systems, Tantalum, Photoresist processing, Semiconducting wafers, Nanofabrication, Nanolithography, Chemically amplified resists

Showing 5 of 8 publications
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