Kazunori Seki
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 12 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Deep ultraviolet, Polarization, Opacity, Inspection, Photomasks, Extreme ultraviolet, Critical dimension metrology, EUV optics, Defect inspection

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Defect detection, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 26 September 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Reticles, Defect detection, Sensors, Error analysis, Inspection, Attenuators, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Logic, Opacity, Etching, Inspection, Chromium, Attenuators, Photomasks, SRAF, Phase shifts

SPIE Journal Paper | 18 March 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Extreme ultraviolet, Photomasks, Semiconducting wafers, Multilayers, Critical dimension metrology, Lithography, Extreme ultraviolet lithography, Microscopes, Scanning electron microscopy, Manufacturing

Showing 5 of 28 publications
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