Kazuo Tawarayama
at Toshiba Corp
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Semiconductors, Lithography, Lithographic illumination, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Reactive ion etching, Photoresist processing, Semiconducting wafers, Yield improvement

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Point spread functions, Logic, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Electronic design automation, Model-based design

Proceedings Article | 5 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Wafer-level optics, Lithography, Modulation, Control systems, Projection systems, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Journal Paper | 1 April 2011
JM3 Vol. 10 Issue 02
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Reflectivity, Deep ultraviolet, Lithography, Semiconducting wafers, Reticles, Visible radiation

Proceedings Article | 29 March 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Multilayers, Defect detection, Inspection, Scanning electron microscopy, Printing, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 22 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top