Mr. Kazuya Fukuhara Profile

Kazuya Fukuhara

Chief Specialist at KIOXIA Corp

SPIE Involvement:

Author

Publications (31)

Proceedings Article | 13 June 2022 Presentation

Evaluation of alignment accuracy for nano-imprint lithography

Kazuya Fukuhara, Masaki Mitsuyasu, Ryo Ogawa, Katsuya Abe, Anupam Mitra, Sachiko Kobayashi, Satoshi Mitsugi, Motofumi Komori, Takuya Kono

Proceedings Volume PC12054, PC120540B (2022) https://doi.org/10.1117/12.2614407

KEYWORDS: Optical alignment, Semiconducting wafers, Nanoimprint lithography, Lithography, Semiconductor manufacturing, Semiconductors, Overlay metrology, Optical simulations, Manufacturing, Wafer-level optics

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Proceedings Article | 26 May 2022 Presentation + Paper

Design process integration enabling the productivity enhancement for nanoimprint lithography

Sachiko Kobayashi, Satoshi Mitsugi, Katsuyoshi Kodera, Kazuya Fukuhara, Anupam Mitra, Koki Ueha, Katsuya Abe, Motofumi Komori, Shingo Kanamitsu, Takuya Kono

Proceedings Volume 12052, 1205208 (2022) https://doi.org/10.1117/12.2614319

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Optical alignment, Optical lithography, Scanning electron microscopy, Ultraviolet radiation, Lithography, Scanning transmission electron microscopy

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SPIE Journal Paper | 4 March 2022

Improvement of productivity by spin-coating and flash imprint lithography

Takahiro Iwasaki, Hirokazu Miyoshi, Anupam Mitra, Masayuki Hatano, Kazuya Fukuhara, Motofumi Komori, Takuya Kono, Tetsuro Nakasugi

JM3, Vol. 21, Issue 01, 011008, (March 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.011008

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Lithography, Head, Photoresist processing, Coating, System on a chip, Overlay metrology, Capillaries, Ultraviolet radiation

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SPIE Journal Paper | 16 December 2021

Multi-field imprint technology: enabling the productivity enhancement of nano-imprint lithography

Tetsuro Nakasugi, Kazuya Fukuhara, Motofumi Komori, Soichi Inoue, Koji Hashimoto, Ryoichi Inanami

JM3, Vol. 21, Issue 01, 011002, (December 2021) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.011002

KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Optical alignment, Lithography, Distortion, Optical lithography, Overlay metrology, Head, Photomasks, Error analysis

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Proceedings Article | 22 February 2021 Presentation + Paper

Multi-field imprint technology: enabling the productivity enhancement of NIL

Tetsuro Nakasugi, Ryoichi Inanami, Kazuya Fukuhara, Motofumi Komori, Sadanori Arae, Soichi Inoue, Koji Hashimoto

Proceedings Volume 11610, 1161008 (2021) https://doi.org/10.1117/12.2583385

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Proceedings Article | 26 March 2019 Paper

Half-pitch 14nm direct patterning with nanoimprint lithography

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Hirokazu Kato, Kazuya Fukuhara, Tetsuro Nakasugi

Proceedings Volume 10958, 109580H (2019) https://doi.org/10.1117/12.2514685

KEYWORDS: Nanoimprint lithography, Optical lithography, Semiconducting wafers, Image processing, Distortion, Overlay metrology, Photoresist processing, Lithography, Particles, Photomasks

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Proceedings Article | 2 May 2018 Presentation + Paper

Improvement of nano-imprint lithography performance for device fabrication

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Kei Kobayashi, Hirokazu Kato, Masato Suzuki, Kazuya Fukuhara, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 10584, 105840V (2018) https://doi.org/10.1117/12.2297294

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Optical alignment, Overlay metrology, Distortion, Particles, Optical lithography, Photoresist processing, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 3 April 2017 Paper

Overlay control for nanoimprint lithography

Kazuya Fukuhara, Masato Suzuki, Masaki Mitsuyasu, Takuya Kono, Tetsuro Nakasugi, Yonghyun Lim, Wooyung Jung

Proceedings Volume 10144, 1014409 (2017) https://doi.org/10.1117/12.2256715

KEYWORDS: Nanoimprint lithography, Overlay metrology, Optical alignment, Lithography, Semiconducting wafers, Distortion, Process control, Error analysis, Silicon, Semiconductor manufacturing

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Proceedings Article | 21 March 2017 Presentation + Paper

Study of nanoimprint lithography (NIL) for HVM of memory devices

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Kei Kobayashi, Masato Suzuki, Kazuya Fukuhara, Masafumi Asano, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 10144, 1014406 (2017) https://doi.org/10.1117/12.2257951

KEYWORDS: Nanoimprint lithography, Overlay metrology, Lithography, Line edge roughness, Semiconductors, Critical dimension metrology, Nanotechnology, Semiconducting wafers, Optical lithography, Particles, Distortion, Optical alignment, Inspection

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Proceedings Article | 2 April 2014 Paper

Improvement of CD-SEM mark position measurement accuracy

Kentaro Kasa, Kazuya Fukuhara

Proceedings Volume 9050, 90502N (2014) https://doi.org/10.1117/12.2046540

KEYWORDS: Monte Carlo methods, Overlay metrology, Critical dimension metrology, Error analysis, Semiconducting wafers, Edge detection, Semiconductors, Diffraction, Scanning electron microscopy, Inspection

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Proceedings Article | 12 April 2013 Paper

Solutions with precise prediction for thermal aberration error in low-k1 immersion lithography

Kazuya Fukuhara, Akiko Mimotogi, Takuya Kono, Hajime Aoyama, Taro Ogata, Naonori Kita, Tomoyuki Matsuyama

Proceedings Volume 8683, 86830U (2013) https://doi.org/10.1117/12.2011691

KEYWORDS: Photomasks, Diffraction, Lithographic illumination, Ions, Neodymium, Semiconductors, Critical dimension metrology, Immersion lithography, Control systems, Lithography

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Proceedings Article | 10 April 2013 Paper

Improvement of focus accuracy on processed wafer

Satomi Higashibata, Nobuhiro Komine, Kazuya Fukuhara, Takashi Koike, Yoshimitsu Kato, Kohji Hashimoto

Proceedings Volume 8681, 868138 (2013) https://doi.org/10.1117/12.2011374

KEYWORDS: Semiconducting wafers, Atrial fibrillation, Sensors, Polysomnography, Phase shifts, Reticles, Scanning electron microscopy, Semiconductors, Optical lithography, Photomasks

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Proceedings Article | 16 March 2009 Paper

Design of resist stacks with antireflection coatings from the viewpoint of focus budget

Satoshi Nagai, Kazuya Sato

Proceedings Volume 7274, 72741H (2009) https://doi.org/10.1117/12.813367

KEYWORDS: Refraction, Photoresist processing, Photomasks, Antireflective coatings, Scanners, Reflection, Calibration, Scanning electron microscopy, Interfaces, Semiconductors

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Proceedings Article | 20 May 2008 Paper

Tool-induced hotspot fixing flow for high volume products

Hiromitsu Mashita, Toshiya Kotani, Fumiharu Nakajima, Hidefumi Mukai, Kazuya Sato, Satoshi Tanaka, Kohji Hashimoto, Soichi Inoue

Proceedings Volume 7028, 70283I (2008) https://doi.org/10.1117/12.793125

KEYWORDS: Optics manufacturing, Optical proximity correction, Astronomical imaging, Critical dimension metrology, Diffractive optical elements, Wafer-level optics, Lithography, Semiconducting wafers, Apodization, Design for manufacturing

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Proceedings Article | 19 May 2008 Paper

Dependence of mask topography effects on pattern variation under hyper-NA lithography

Akiko Mimotogi, Masamitsu Itoh, Shoji Mimotogi, Kazuya Sato, Takashi Sato, Satoshi Tanaka, Soichi Inoue

Proceedings Volume 7028, 70283K (2008) https://doi.org/10.1117/12.793127

KEYWORDS: Photomasks, Diffraction, Waveguides, Lithography, Near field, Semiconducting wafers, Phase shifts, Transmittance, Data modeling, Thin films

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Proceedings Article | 17 March 2008 Paper

Robust PPC and DFM methodology for exposure tool variations

Toshiya Kotani, Fumiharu Nakajima, Hiromitsu Mashita, Kazuya Sato, Satoshi Tanaka, Soichi Inoue

Proceedings Volume 6924, 69241F (2008) https://doi.org/10.1117/12.771387

KEYWORDS: Optical proximity correction, Optics manufacturing, Design for manufacturing, Wafer-level optics, Astronomical imaging, Optical design, Critical dimension metrology, Lithography, Design for manufacturability, Optical testing

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Proceedings Article | 12 March 2008 Paper

Influence of pellicle on hyper-NA imaging

Kazuya Sato, Satoshi Nagai, Nakagawa Shinichiro, Takashi Sato, Masamitsu Itoh

Proceedings Volume 6924, 692451 (2008) https://doi.org/10.1117/12.772612

KEYWORDS: Pellicles, Critical dimension metrology, Transmittance, Refractive index, Polarization, Wavefronts, Reflection, Apodization, Phase shifts, Lithography

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Proceedings Article | 7 March 2008 Paper

Prediction of imaging performance of immersion lithography using high refractive index fluid

Takashi Sato, Masamitsu Itoh, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka

Proceedings Volume 6924, 69242F (2008) https://doi.org/10.1117/12.772283

KEYWORDS: Photomasks, Transmittance, Pellicles, Lithographic illumination, Lithography, Immersion lithography, Polarization, Diffraction, Refractive index, Projection systems

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Proceedings Article | 14 May 2007 Paper

Mask topography effects of hole patterns on hyper-NA lithography

Akiko Mimotogi, Masamitsu Itoh, Shoji Mimotogi, Kazuya Sato, Takashi Sato, Satoshi Tanaka

Proceedings Volume 6607, 66071F (2007) https://doi.org/10.1117/12.728963

KEYWORDS: Photomasks, Diffraction, Waveguides, Lithography, Factor analysis, Logic, Near field, Data modeling, Thin films, Focus stacking software

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Proceedings Article | 26 March 2007 Paper

Mask 3D effect on 45-nm imaging using attenuated PSM

Kazuya Sato, Masamitsu Itoh, Takashi Sato

Proceedings Volume 6520, 65201J (2007) https://doi.org/10.1117/12.710549

KEYWORDS: 3D modeling, Photomasks, 3D image processing, Transmittance, Critical dimension metrology, Nanoimprint lithography, Refractive index, Electroluminescence, Diffraction, Image transmission

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Proceedings Article | 19 May 2006 Paper

Hp45 lithography in consideration of the mask 3D effect

Kazuya Sato, Masamitsu Itoh, Takashi Sato

Proceedings Volume 6283, 62831F (2006) https://doi.org/10.1117/12.681882

KEYWORDS: Photomasks, Transmittance, Critical dimension metrology, SRAF, Electroluminescence, Printing, Semiconducting wafers, Diffraction, Lithography, Nanoimprint lithography

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Proceedings Article | 12 May 2005 Paper

Optical lithography technologies for 45-nm node CMOS

Shoji Mimotogi, Fumikatsu Uesawa, Suigen Kyoh, Hiroharu Fujise, Eishi Shiobara, Mikio Katsumata, Hiroki Hane, Tomohiro Sugiyama, Koutaro Sho, Maki Miyazaki, Kazuhiro Takahata, Hideki Kanai, Kazuya Sato, Kohji Hashimoto

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600948

KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Lens design, Photoresist processing, CMOS technology, Optical lithography, Metals, Logic, Semiconductors

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Proceedings Article | 12 May 2005 Paper

Mid-range flare measurement and modeling

Kazuya Sato, Kenji Chiba, Kei Hayasaki, Kenji Kawano

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599605

KEYWORDS: Critical dimension metrology, Magnetorheological finishing, Photomasks, Point spread functions, Double patterning technology, Photoresist materials, Photoresist developing, Semiconducting wafers, Data modeling, Light scattering

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Proceedings Article | 12 May 2005 Paper

How to separate CD variation on local pattern density into error sources?

Kenji Kawano, Kazuya Sato, Kei Hayasaki, Kenji Chiba, Kohji Hashimoto

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601114

KEYWORDS: Critical dimension metrology, Photomasks, Photoresist processing, Semiconducting wafers, Double patterning technology, Dubnium, Reticles, Manufacturing, Error analysis, Process engineering

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Proceedings Article | 12 May 2005 Paper

Impact of polarization for an attenuated phase-shift mask with ArF hyper-NA lithography

Takashi Sato, Ayako Endo, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598458

KEYWORDS: Polarization, Photomasks, Phase shifts, Chromium, Lithography, Lithographic illumination, Semiconducting wafers, Electroluminescence, Transmittance, Tolerancing

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SPIE Journal Paper | 1 April 2005

Contact hole formation by multiple exposure technique in ultralow k₁ lithography

Hiroko Nakamura, Yasunobu Onishi, Kazuya Sato, Satoshi Tanaka, Shoji Mimotogi, Koji Hashimoto, Soichi Inoue

JM3, Vol. 4, Issue 02, 023005, (April 2005) https://doi.org/10.1117/12.10.1117/1.1899324

KEYWORDS: Photomasks, Double patterning technology, Optical lithography, Photoresist processing, Scanning electron microscopy, Phase shifts, Lithographic illumination, Lithography, Semiconducting wafers, Scanners

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Proceedings Article | 28 May 2004 Paper

Study of the impact of illumination intensity distribution on resist parameter modification

Daisuke Kawamura, Kazuya Sato, Shoji Mimotogi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535169

KEYWORDS: Finite element methods, Photomasks, Semiconducting wafers, Data modeling, Critical dimension metrology, Scanning electron microscopy, Diffraction, Temperature metrology, Solids, Scanners

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Proceedings Article | 28 May 2004 Paper

Contact hole formation by multiple exposure technique in ultralow k1 lithography

Hiroko Nakamura, Yasunobu Onishi, Kazuya Sato, Satoshi Tanaka, Shoji Mimotogi, Koji Hashimoto, Soichi Inoue

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535114

KEYWORDS: Photomasks, Double patterning technology, Optical lithography, Scanning electron microscopy, Lithographic illumination, Lithography, Semiconducting wafers, Photoresist processing, Phase shifts, Scanners

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Proceedings Article | 26 June 2003 Paper

Impact of across-pupil transmittance variation in projection lenses on fine device pattern imaging

Kazuya Sato, Shoji Mimotogi, Soichi Inoue, Tatsuhiko Higashiki

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485453

KEYWORDS: Transmittance, Imaging devices, Critical dimension metrology, Photomasks, Zernike polynomials, Lenses, Wavefront aberrations, Lithography, Diffraction, Optical proximity correction

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Proceedings Article | 14 September 2001 Paper

Measurement of transmittance variation of projection lenses depending on the light paths using a grating-pinhole mask

Kazuya Sato, Soichi Inoue

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435737

KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Global Positioning System, Diffraction gratings, Inspection, Diffraction, Photoresist materials, Lenses, Image transmission

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Proceedings Article | 26 July 1999 Paper

Measurement of effective source shift using a grating-pinhole mask

Kazuya Sato, Satoshi Tanaka, Tadahito Fujisawa, Soichi Inoue

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354402

KEYWORDS: Photomasks, Semiconducting wafers, Diffraction, Diffraction gratings, Projection systems, Photoresist materials, Phase shifts, Lithographic illumination, Optical design, Optical microscopes

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Showing 5 of 31 publications

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