Kazuya Fukuhara
Chief Specialist at Kioxia Corp.
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Optical lithography, Image processing, Particles, Distortion, Photomasks, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 May 2018 Presentation + Paper
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Particles, Distortion, Extreme ultraviolet lithography, Nanoimprint lithography, Optical alignment, Photoresist processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 3 April 2017 Paper
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Error analysis, Silicon, Distortion, Process control, Semiconductor manufacturing, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 21 March 2017 Presentation + Paper
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Semiconductors, Nanotechnology, Lithography, Optical lithography, Particles, Inspection, Distortion, Nanoimprint lithography, Optical alignment, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Diffraction, Edge detection, Error analysis, Inspection, Scanning electron microscopy, Monte Carlo methods, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Showing 5 of 26 publications
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