Kazuya Iwase
Assistant Manager at Sony Corp
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Surface plasmons, Logic, Photomasks, Double patterning technology, Source mask optimization, SRAF, Critical dimension metrology, Molybdenum, Model-based design, Resolution enhancement technologies

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Photovoltaics, Surface plasmons, Logic, Lithium, Optical lithography, Photomasks, Transistors, Double patterning technology, Source mask optimization, Semiconducting wafers

Proceedings Article | 11 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Etching, Reflectivity, Chromium, Scanning electron microscopy, Printing, Photomasks, Image enhancement, Semiconducting wafers, Binary data, Resolution enhancement technologies

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Polarization, Birefringence, Wave plates, Electroluminescence, Photomasks, Cadmium sulfide, Critical dimension metrology, Tolerancing, Lawrencium

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Lithographic illumination, Polarization, Birefringence, Error analysis, Electroluminescence, Photomasks, Immersion lithography, Tolerancing, Fiber optic illuminators

Showing 5 of 20 publications
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