Dr. Kazuya Matsumoto
Student at Tokyo Institute of Technology
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Polymers, Ultraviolet radiation, Diffusion, Line width roughness, Semiconducting wafers, Polymer thin films, Chemically amplified resists

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Refractive index, Polymers, Water, Sulfur, Chemistry, Imaging spectroscopy, Absorbance, Immersion lithography, Chlorine, Absorption

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Carbon, Refractive index, Optical properties, Water, Electrons, Refraction, Absorbance, Immersion lithography, Sodium, Absorption

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top