Dr. Kazuya Matsumoto
Student at Tokyo Institute of Technology
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Polymers, Diffusion, Line width roughness, Lithography, Optical lithography, Ultraviolet radiation, Semiconducting wafers, Chemically amplified resists, Polymer thin films, Polymethylmethacrylate

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Refractive index, Absorbance, Polymers, Absorption, Chlorine, Immersion lithography, Sulfur, Chemistry, Water, Imaging spectroscopy

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Absorbance, Water, Optical properties, Immersion lithography, Refraction, Absorption, Carbon, Sodium, Refractive index, Electrons

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