Mr. Kazuya Ota Profile

Kazuya Ota

SPIE Involvement:

Author

Publications (25)

Proceedings Article | 1 April 2013 Paper

Silica aerogel can capture flying particles in EUV tools

Kazuya Ota, Jiro Inoue

Proceedings Volume 8679, 86792R (2013) https://doi.org/10.1117/12.2010344

KEYWORDS: Particles, Silica, Extreme ultraviolet, Protactinium, Fourier transforms, Reticles, Tin, Argon, Optical spheres, Virtual colonoscopy

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SPIE Journal Paper | 27 February 2012

Particle protection capability of extreme ultraviolet lithography mask carriers based on the gap effect and filter effect

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

JM3, Vol. 11, Issue 1, 013002, (February 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013002

KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters

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Proceedings Article | 8 April 2011 Paper

Evaluation results of a new EUV reticle pod having reticle grounding paths

Kazuya Ota, Masami Yonekawa, Mitsuaki Amemiya, Takao Taguchi, Osamu Suga

Proceedings Volume 7969, 79691V (2011) https://doi.org/10.1117/12.879553

KEYWORDS: Reticles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Electrodes, Photomasks, Particle contamination, Resistance, Dielectric polarization

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Proceedings Article | 8 April 2011 Paper

Overlay accuracy of EUV1 using compensation method for nonflatness of mask

Yuusuke Tanaka, Takashi Kamo, Kazuya Ota, Hiroyuki Tanaka, Osamu Suga, Masamitsu Itoh, Shusuke Yoshitake

Proceedings Volume 7969, 796936 (2011) https://doi.org/10.1117/12.879340

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Photovoltaics, Semiconducting wafers, Source mask optimization, Overlay metrology, Extreme ultraviolet, Scanners, Lithography, Distortion

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SPIE Journal Paper | 1 January 2011

Study of electrification of extreme ultraviolet lithography mask and adhesion of particles during electrostatic chucking

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

JM3, Vol. 10, Issue 1, 013002, (January 2011) https://doi.org/10.1117/12.10.1117/1.3532835

KEYWORDS: Photomasks, Particles, Extreme ultraviolet lithography, Dielectrics, Electrodes, Quartz, Resistance, Dielectric polarization, Solids, Inspection

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Proceedings Article | 27 May 2010 Paper

Study on counting error in particle inspection

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

Proceedings Volume 7748, 77481B (2010) https://doi.org/10.1117/12.867929

KEYWORDS: Particles, Inspection, Signal detection, Photomasks, Error analysis, Extreme ultraviolet lithography, Strontium, Nickel, Laser scattering, Scattering

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Proceedings Article | 26 May 2010 Paper

Evaluation of transfer of particles from dual-pod base plate to EUV mask

Masami Yonekawa, Kazuya Ota, Takao Taguchi, Osamu Suga

Proceedings Volume 7748, 774820 (2010) https://doi.org/10.1117/12.867044

KEYWORDS: Particles, Photomasks, Extreme ultraviolet, Nickel, Silica, Atmospheric particles, Inspection, Image processing, Semiconducting wafers, Statistical analysis

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Proceedings Article | 20 March 2010 Paper

Evaluation results of a new EUV reticle pod based on SEMI E152

Kazuya Ota, Masami Yonekawa, Takao Taguchi, Osamu Suga

Proceedings Volume 7636, 76361F (2010) https://doi.org/10.1117/12.846316

KEYWORDS: Reticles, Particles, Prototyping, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Photomasks, Tolerancing, Packaging, Data storage

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Proceedings Article | 18 March 2009 Paper

Analysis of a relation between the spatial frequency of electrostatic chuck and induced mask inplane distortion (IPD)

Takeshi Yamamoto, Kazuya Ota, Naosuke Nishimura, Shin'ichi Warisawa, Sunao Ishihara

Proceedings Volume 7271, 72713K (2009) https://doi.org/10.1117/12.814451

KEYWORDS: Spatial frequencies, Photomasks, Extreme ultraviolet lithography, Surface roughness, Distortion, Standards development, 3D modeling, Surface finishing, Lithography, Glasses

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Proceedings Article | 18 March 2009 Paper

Experimental study of particle-free mask handling

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

Proceedings Volume 7271, 72713G (2009) https://doi.org/10.1117/12.813371

KEYWORDS: Particles, Photomasks, Electrodes, Quartz, Resistance, Extreme ultraviolet lithography, Extreme ultraviolet, Latex, Inspection, Defect detection

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Proceedings Article | 18 March 2009 Paper

Experimental evaluation of particulate contamination on backside of EUV reticle

Kazuya Ota, Takao Taguchi, Mitsuaki Amemiya, Naosuke Nishimura, Osamu Suga

Proceedings Volume 7271, 72713M (2009) https://doi.org/10.1117/12.812952

KEYWORDS: Particles, Reticles, Optical spheres, Carbon, Extreme ultraviolet, Silicon carbide, Interferometers, Quartz, Photovoltaics, Extreme ultraviolet lithography

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Proceedings Article | 19 May 2008 Paper

Selete EUV reticle shipping and storage test results

Kazuya Ota, Mitsuaki Amemiya, Takao Taguchi, Osamu Suga

Proceedings Volume 7028, 70280I (2008) https://doi.org/10.1117/12.793025

KEYWORDS: Reticles, Particles, Inspection, Extreme ultraviolet, Photomasks, Humidity, Pellicles, Quartz, Data storage, Extreme ultraviolet lithography

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Proceedings Article | 3 April 2008 Paper

Particle-free mask handling techniques and a dual-pod carrier

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Takashi Kamono, Youichi Usui, Tadahiko Takikawa, Osamu Suga

Proceedings Volume 6921, 69213T (2008) https://doi.org/10.1117/12.771569

KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Inspection, Error analysis, Particle contamination, Reticles, Protactinium, Pellicles, Absorption

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Proceedings Article | 21 March 2008 Paper

Experimental evaluation of out-of-plane distortion of electrostatically chucked EUV reticle

Kazuya Ota, Takao Taguchi, Mitsuaki Amemiya, Yasushi Nishiyama, Takashi Kamono, Naosuke Nishimura, Tadahiko Takikawa, Youichi Usui, Osamu Suga

Proceedings Volume 6921, 69213S (2008) https://doi.org/10.1117/12.771339

KEYWORDS: Reticles, Particles, Carbon, Extreme ultraviolet, Quartz, Distortion, Silicon carbide, Interferometers, Photovoltaics, Semiconducting wafers

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Proceedings Article | 15 May 2007 Paper

Development of a novel EUV mask protection engineering tool and mask handling techniques

Mitsuaki Amemiya, Kazuya Ota, Takashi Kamono, Hiroyoshi Kubo, Youichi Usui, Tadahiko Takikawa, Takao Taguchi, Osamu Suga

Proceedings Volume 6607, 66073G (2007) https://doi.org/10.1117/12.729035

KEYWORDS: Particles, Photomasks, Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Atmospheric particles, Contamination, Quartz, Protactinium

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Proceedings Article | 20 March 2007 Paper

Development of EUV mask handling technology at MIRAI-Selete

Kazuya Ota, Mitsuaki Amemiya, Takao Taguchi, Takashi Kamono, Hiroyoshi Kubo, Tadahiko Takikawa, Yoichi Usui, Osamu Suga

Proceedings Volume 6517, 65171Z (2007) https://doi.org/10.1117/12.711317

KEYWORDS: Photomasks, Particles, Extreme ultraviolet, Inspection, Pellicles, Interferometers, Defect detection, Time metrology, Laser applications, Manufacturing

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Proceedings Article | 15 March 2007 Paper

EUVL mask dual pods to be used for mask shipping and handling in exposure tools

Yoshio Gomei, Kazuya Ota, John Lystad, Dave Halbmair, Long He

Proceedings Volume 6517, 65170W (2007) https://doi.org/10.1117/12.711296

KEYWORDS: Photomasks, Particles, Extreme ultraviolet lithography, Particle contamination, Semiconducting wafers, Pellicles, Prototyping, Lithography, Quartz, Ultraviolet radiation

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Proceedings Article | 16 June 2003 Paper

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Tetsuya Oshino, Masayuki Shiraishi, Noriaki Kandaka, Katsumi Sugisaki, Hiroyuki Kondo, Kazuya Ota, K. Mashima, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484936

KEYWORDS: Mirrors, Projection systems, Wavefronts, Extreme ultraviolet lithography, Spherical lenses, Metals, Mirror mounts, Optical components, Lithographic illumination, Photography

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Proceedings Article | 16 June 2003 Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

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SPIE Journal Paper | 1 April 2003

Simulation model of in-plane distortion in extreme ultraviolet lithography mask during chucking without friction

Akira Chiba, Eiichi Hoshino, Minoru Sugawara, Hiromasa Yamanashi, Kazuya Ota, Taro Ogawa, Shinji Okazaki

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1563645

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Multilayers, Distortion, Mathematical modeling, Interfaces, Glasses, Tantalum, Error analysis, Quartz

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Proceedings Article | 1 July 2002 Paper

Simulation model of in-plane distortion in EUVL mask during chucking

Akira Chiba, Kazuya Ota, Eiichi Hoshino, Minoru Sugawara, Taro Ogawa, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472348

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Free space, Distortion, Mathematical modeling, Image processing, Finite element methods, Finite difference methods, Lithography

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Proceedings Article | 1 July 2002 Paper

Aspherical mirror measurement using a point diffraction interferometer

Kazuya Ota, Takahiro Yamamoto, Yusuke Fukuda, Katsura Otaki, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472343

KEYWORDS: Mirrors, Extreme ultraviolet, Error analysis, Spherical lenses, Point diffraction interferometers, Projection systems, Distance measurement, Interferometry, Wavefronts, Aspheric lenses

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Proceedings Article | 20 August 2001 Paper

Feasibility study of EUV scanners

Kazuya Ota, Katsuhiko Murakami, Hiroyuki Kondo, Tetsuya Oshino, Katsumi Sugisaki, Hideki Komatsuda

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436704

KEYWORDS: Semiconducting wafers, Scanners, Mirrors, Reticles, Extreme ultraviolet lithography, Optical alignment, Sensors, Projection systems, Deep ultraviolet, Extreme ultraviolet

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Proceedings Article | 20 August 2001 Paper

Advanced point diffraction interferometer for EUV aspherical mirrors

Kazuya Ota, Takahiro Yamamoto, Yusuke Fukuda, Katsura Otaki, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436686

KEYWORDS: Mirrors, Extreme ultraviolet, Helium, Point diffraction interferometers, Interferometers, Wavefront aberrations, Objectives, Spherical lenses, Wavefronts, Phase shifting

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Proceedings Article | 1 July 1991 Paper

New alignment sensors for wafer stepper

Kazuya Ota, Nobutaka Magome, Kenji Nishi

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44790

KEYWORDS: Optical alignment, Semiconducting wafers, Sensors, Photoresist materials, Spatial frequencies, Metals, Bragg cells, Light sources, Interferometry, Heterodyning

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