Kazuya Ota
at Lasertec Corp
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, Optical spheres, Silica, Argon, Particles, Fourier transforms, Extreme ultraviolet, Tin, Virtual colonoscopy, Protactinium

SPIE Journal Paper | 27 February 2012
JM3 Vol. 11 Issue 1
KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Electrodes, Particles, Resistance, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination, Dielectric polarization

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Photovoltaics, Scanners, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 1 January 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Photomasks, Particles, Extreme ultraviolet lithography, Dielectrics, Electrodes, Quartz, Resistance, Dielectric polarization, Solids, Inspection

Showing 5 of 25 publications
Proceedings Volume Editor (2)

Conference Committee Involvement (3)
Advances in X-Ray/EUV Optics and Components III
11 August 2008 | San Diego, California, United States
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
5 August 2004 | Denver, Colorado, United States
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
7 August 2003 | San Diego, California, United States
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