Kazuya Sugawa
at Fujitsu Semiconductor Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Data modeling, Diffusion, Data processing, Microelectronics, Transistors, Optical proximity correction, Picosecond phenomena, Connectors, Device simulation, Resolution enhancement technologies

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Optical filters, Reticles, Image processing, Photography, Inspection, Scanning electron microscopy, Image filtering, Optical simulations, Critical dimension metrology, Optics manufacturing

Proceedings Article | 1 August 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Optical filters, Image processing, Manufacturing, Fourier transforms, Gaussian filters, Image filtering, Photomasks, Optical simulations, Optical proximity correction, Semiconducting wafers

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