Mr. Kazuyuki Hagiwara
Senior Engineer at D2S KK
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Data modeling, Computer simulations, Photomasks, Optical proximity correction, Mask making, Computer aided design, Reactive ion etching, Model-based design, Process modeling

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Lithography, Databases, Inspection, Scanning electron microscopy, Optical inspection, 3D metrology, Photomasks, Semiconducting wafers, 3D image processing, Defect inspection

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Lithography, Electron beams, Logic, Data modeling, Computer simulations, Photomasks, Mask making, Critical dimension metrology, Model-based design, Process modeling

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Sensors, Databases, Inspection, Scanning electron microscopy, Image quality, 3D metrology, Photomasks, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beams, Logic, Data modeling, Modulation, Photomasks, Immersion lithography, SRAF, Mask making, Model-based design, Vestigial sideband modulation

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Data modeling, Error analysis, Quality measurement, Monte Carlo methods, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design

Showing 5 of 7 publications
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