Kazuyuki Matsumaro
at National Institute of Advanced Industrial Science
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical components, Mirrors, Contamination, Statistical analysis, Spectroscopy, Photography, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Protactinium

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Semiconductors, Lithography, Etching, Manufacturing, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Fullerenes

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Calibration, Molecules, Ions, Mass spectrometry, Ionization, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Semiconducting wafers, Chromatography

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Semiconductors, Lithography, Materials processing, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Analytical research, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Sensors, Particles, Coating, Materials processing, Inspection, Control systems, Wafer inspection, Immersion lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Electron beam lithography, Etching, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Failure analysis, Back end of line

Showing 5 of 6 publications
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