Kazuyuki Yoshimochi
at KIOXIA Corporation
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Cadmium, Etching, Resistance, Process control, Logic devices, Spatial resolution, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Data modeling, Remote sensing, Error analysis, Inspection, Photomasks, Source mask optimization, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 13 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Manufacturing, Electroluminescence, Photomasks, Logic devices, Source mask optimization, SRAF, Fiber optic illuminators

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Calibration, Image processing, Scanners, Scanning electron microscopy, Photomasks, Logic devices, Source mask optimization, SRAF, Molybdenum, Binary data

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Light sources, Computer simulations, Laser stabilization, Optical simulations, Laser cutting, Logic devices, SRAF, Critical dimension metrology, Tolerancing, Combined lens-mirror systems

Showing 5 of 8 publications
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