Kei Sakai
at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Inspection, Optical inspection, Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Chemical reactions, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Ranging

SPIE Journal Paper | 3 May 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Stochastic processes, Inspection, Cadmium, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Critical dimension metrology, Integrated circuits, Defect inspection

SPIE Journal Paper | 23 July 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Edge detection, Metrology, Detection and tracking algorithms, Reliability, Scanning electron microscopy, Process control, Image filtering, Critical dimension metrology, Line edge roughness

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Thin films, Optical lithography, Polymethylmethacrylate, Materials processing, Scanning electron microscopy, Line width roughness, Directed self assembly, Picosecond phenomena, Line edge roughness, Edge roughness

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