Mr. Kei Yamamoto
at FUJIFILM Corp
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Coating, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, High volume manufacturing, Fluorine, Photoresist processing, Semiconducting wafers, Research management, Chemically amplified resists

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Mechanics, Polymers, Diffusion, Image resolution, Electroluminescence, Bridges, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Electroluminescence, Scanning electron microscopy, Immersion lithography, Photoresist processing, Semiconducting wafers, Research management

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Optical lithography, Imaging systems, Etching, Coating, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Photoresist processing

PROCEEDINGS ARTICLE | March 8, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Carbon, Lithography, Optical lithography, Etching, Dry etching, Polymers, Resistance, Scanning electron microscopy, Photomasks, Photoresist processing

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Water, Scanners, Materials processing, Digital watermarking, Head, Silicon films, Photoresist processing, Liquids

Showing 5 of 7 publications
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