Keiichi Hatta
at NEC Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 29 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Sensors, Particles, Inspection, Photomasks, Semiconducting wafers, Resolution enhancement technologies, Defect inspection

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Point spread functions, Deep ultraviolet, Inspection, Chromium, Photomasks, Optical proximity correction, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Detection and tracking algorithms, Deep ultraviolet, Databases, Inspection, Photomasks, Optical proximity correction, Algorithm development, Binary data

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Defect detection, Inspection, Chromium, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Proceedings Article | 1 August 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Semiconductors, Lithography, Reticles, Inspection, Photomasks, Halftones, 193nm lithography

Showing 5 of 6 publications
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