Keiichiro Hitomi
at Hitachi America Ltd
SPIE Involvement:
Author
Publications (9)

SPIE Journal Paper | October 12, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Electron microscopes, Extreme ultraviolet lithography, Electron beams, Image processing, Double patterning technology, Solids, Precision measurement

SPIE Journal Paper | July 19, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

PROCEEDINGS ARTICLE | March 31, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Optical lithography, Data modeling, Calibration, Scanning electron microscopy, Finite element methods, Cadmium sulfide, Optical proximity correction, Semiconducting wafers, Statistical modeling, Front end of line

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Electron beams, Metrology, Image processing, Error analysis, Electron microscopes, Optical testing, Scanning electron microscopy, Precision measurement, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Electron beams, Metrology, Image processing, Precision measurement, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Metrology, Data modeling, Calibration, Metals, Scanning electron microscopy, Logic devices, Optical proximity correction, Critical dimension metrology, OLE for process control, Instrument modeling

Showing 5 of 9 publications
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