Dr. Keiko Morishita
at Toshiba Memory Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, SRAF, Tantalum

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Target detection, Signal to noise ratio, Defect detection, Deep ultraviolet, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Electron beams, Optical lithography, Etching, Scanning electron microscopy, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Optical lithography, Etching, X-rays, Image quality, Double patterning technology, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Defect inspection

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Etching, Error analysis, Manufacturing, Surface roughness, Image analysis, Bridges, Photomasks, Chemical reactions, Semiconducting wafers, Industrial chemicals

Showing 5 of 9 publications
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