Dr. Keisuke Yoshida Profile

Dr. Keisuke Yoshida

at Tokyo Electron Kyushu Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 13 June 2022 Poster

Fundamental study of inorganic middle layer film for EUV patterning

Soichiro Okada, Keisuke Yoshida, Hiroyuki Fujii, Satoru Shimura

Proceedings Volume PC12055, PC120550O (2022) https://doi.org/10.1117/12.2614092

KEYWORDS: Extreme ultraviolet, Optical lithography, Silicon carbide, Etching, Semiconductor manufacturing, Photomasks, Extreme ultraviolet lithography, Coating, Chemically amplified resists

Proceedings Article | 28 September 2021 Presentation

Addressing EUV patterning challenges towards the limits of NA 0.33 EUV exposure

Arnaud Dauendorffer, Tomoya Onitsuka, Hiroki Tadatomo, Keisuke Yoshida, Takahiro Shiozawa, Hisashi Genjima, Noriaki Nagamine, Yuya Kamei, Soichiro Okada, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Ainhoa Romo Negreira, Seiji Nagahara, Congque Dinh, Luka Kljucar, Danilo De Simone, Philippe Foubert

Proceedings Volume 11854, 118540B (2021) https://doi.org/10.1117/12.2600860

KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Metals, Etching, Stochastic processes, Semiconductors, Semiconductor manufacturing, Resistance, Photomasks, Particles

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

EUV defect reduction activities using coater/developer and etching technique

Takahiro Shiozawa, Keisuke Yoshida, Noriaki Nagamine, Arnaud Dauendorffer, Satoru Shimura, Kathleen Nafus, Yannick Feurprier, Kenta Ono, Shota Yoshimura, Atsutoshi Inokuchi, Kiyoshi Maeda, Tetsuya Nishizuka, Shinya Morikita, Yoshihide Kihara, Ken Kobayashi

Proceedings Volume 11612, 116120T (2021) https://doi.org/10.1117/12.2583772

KEYWORDS: Extreme ultraviolet, Etching, Extreme ultraviolet lithography, Stochastic processes, Photoresist processing, Particles, Lithographic illumination, High volume manufacturing

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Enabling EUV pattern transfer by optimized under layer

Soichiro Okada, Keisuke Yoshida, Satoru Shimura

Proceedings Volume 11612, 116120V (2021) https://doi.org/10.1117/12.2583771

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Lithography, Photomasks

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Proceedings Article | 22 February 2021 Presentation + Paper

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Cong Que Dinh, Seiji Nagahara, Keisuke Yoshida, Yoshihiro Kondo, Makoto Muramatsu, Kosuke Yoshihara, Ryo Shimada, Teruhiko Moriya, Kathleen Nafus, John Petersen, Danilo De Simone, Philippe Foubert, Geert Vandenberghe

Proceedings Volume 11612, 116120L (2021) https://doi.org/10.1117/12.2583922

KEYWORDS: Extreme ultraviolet lithography, Ultraviolet radiation, Floods, Extreme ultraviolet, Stochastic processes, Chemically amplified resists

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Proceedings Article | 20 September 2020 Presentation

Improvement of EUV processes for high volume manufacturing

Makoto Muramatsu, Hiroki Tadatomo, Tomoya Onitsuka, Keisuke Yoshida, Arnaud Dauendorffer, Takahiro Shiozawa, Soichiro Okada, Shinichiro Kawakami, Satoru Shimura

Proceedings Volume 11517, 115170M (2020) https://doi.org/10.1117/12.2572637

KEYWORDS: Extreme ultraviolet, High volume manufacturing, Etching, Extreme ultraviolet lithography, Lithography, Semiconductors, Photomasks, Stochastic processes, Liquids, Photoresist processing

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Proceedings Article | 30 March 2020 Presentation + Paper

EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity, and stochastic defectivity

Seiji Nagahara, Cong Que Dinh, Keisuke Yoshida, Gosuke Shiraishi, Yoshihiro Kondo, Kosuke Yoshihara, Kathleen Nafus, John Petersen, Danilo De Simone, Philippe Foubert, Geert Vandenberghe, Hans-Jürgen Stock, Balint Meliorisz

Proceedings Volume 11326, 113260A (2020) https://doi.org/10.1117/12.2552166

KEYWORDS: Stochastic processes, Ultraviolet radiation, Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Optical lithography, Absorption

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Proceedings Article | 23 March 2020 Paper

CLEAN TRACK solutions for defectivity and CD control towards 5 nm and smaller nodes

Arnaud Dauendorffer, Takahiro Shiozawa, Keisuke Yoshida, Noriaki Nagamine, Yuya Kamei, Shinichiro Kawakami, Satoru Shimura, Kathleen Nafus, Akihiro Sonoda, Philippe Foubert

Proceedings Volume 11323, 113232A (2020) https://doi.org/10.1117/12.2551627

KEYWORDS: Photoresist materials, Critical dimension metrology, Etching, Extreme ultraviolet lithography, Bridges, Extreme ultraviolet, Stochastic processes, Semiconducting wafers, Photoresist processing

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Proceedings Article | 26 March 2019 Presentation + Paper

Impact of local variability on defect-aware process windows

Mark John Maslow, Hidetami Yaegashi, Andreas Frommhold, Guido Schiffelers, Felix Wahlisch, Gijsbert Rispens, Bram Slachter, Keisuke Yoshida, Arisa Hara, Noriaki Oikawa, Abhinav Pathak, Dorin Cerbu, Eric Hendrickx, Joost Bekaert

Proceedings Volume 10957, 109570H (2019) https://doi.org/10.1117/12.2514719

KEYWORDS: Critical dimension metrology, Etching, Metrology, Lithography, Semiconducting wafers, Photoresist processing, Statistical analysis, Optical lithography, Stochastic processes

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Showing 5 of 9 publications

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