Keizo Yamada
at Holon Co Ltd
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Electron beams, Defect detection, Deep ultraviolet, Sensors, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Computer aided design, Holons

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Defect detection, Inspection, Scanning electron microscopy, Printing, Photomasks, Computer aided design, Semiconducting wafers, Holons, Defect inspection

PROCEEDINGS ARTICLE | April 6, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Semiconductors, Sensors, Manufacturing, Resistance, Inspection, Capacitance, Signal processing, Measurement devices, Signal analyzers, Signal detection

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Oxides, Thin films, Scattering, Image processing, Dielectrics, Electrons, Interfaces, Monte Carlo methods, Device simulation

PROCEEDINGS ARTICLE | July 15, 2003
Proc. SPIE. 5041, Process and Materials Characterization and Diagnostics in IC Manufacturing
KEYWORDS: Semiconductors, Electron beams, Silica, Etching, Silicon, Manufacturing, Scanning electron microscopy, Process control, Semiconducting wafers, Yield improvement

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Semiconductors, Electron beams, Silica, Etching, Silicon, Control systems, Scanning electron microscopy, Process control, Semiconducting wafers, Yield improvement

Showing 5 of 6 publications
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