Kelly A. Barry
at Tokyo Electron America Inc
SPIE Involvement:
Author | Instructor
Publications (7)

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Cadmium, 3D applications, Etching, Inspection, Scanning electron microscopy, Scatterometry, 3D metrology, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Metrology, Cadmium, Silicon, Scanning electron microscopy, Scatterometry, 3D metrology, Silicon carbide, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Semiconductors, Metrology, Cadmium, Scatterometry, Process control, Finite element methods, Integrated optics, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Optical filters, Metrology, Ultraviolet radiation, Silicon, Reflectivity, Photoresist materials, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Oxides, Lithography, Metrology, Scanning electron microscopy, Scatterometry, 3D metrology, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 29, 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Lithography, Metrology, Control systems, Scatterometry, Time metrology, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Showing 5 of 7 publications
Course Instructor
SC831: Introduction to Scatterometry Metrology: Theory and Application
This course provides an introduction to the theory of scatterometry metrology, as well as its application for process control in semiconductor manufacturing. Both the software and the hardware portions of the scatterometry system are covered. Scatterometry is an optical method to measure profiles (CD, sidewall angle, height) features on semiconductor wafers and photomasks. Scatterometry is becoming widely adopted for production-worthy metrology as an alternative and complementary tool to CD-SEM and AFM.
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