Kelly O'Brien
Senior Applications Development Engineer at KLA Oregon
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Scanners, Radium, Lithography, Visualization, Performance modeling, Immersion lithography, Double patterning technology

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Metrology, Double patterning technology, Performance modeling, Data modeling, Lithography, Optical lithography, Statistical modeling

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