Mr. Ken Ando Profile

Ken Ando

at Tokyo Electron Europe Ltd

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Publications (1)

Proceedings Article | 22 November 2023 Poster

Holistic litho-etch approach towards high NA EUV challenges

Soichiro Okada, Arnaud Dauendorffer, Yuhei Kuwahara, Satoru Shimura, Philippe Foubert, Danilo De Simone, Cong Que Dinh, Ken Ando, Atsushi Tsuboi, Nobuyuki Fukui, Arame Thiam, Yannick Feurprier, Kathleen Nafus

Proceedings Volume PC12750, PC1275011 (2023) https://doi.org/10.1117/12.2687568

KEYWORDS: Extreme ultraviolet, Etching, Plasma etching, Photoresist materials, Optical lithography, Critical dimension metrology, Plasma, Metal oxides, Lithography, High volume manufacturing

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