Ken Furubayashi
at Toshiba Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Lenses, Opacity, Etching, Metals, Scanners, Photoresist materials, Photomasks, Double patterning technology, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Anisotropic etching

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