Dr. Ken Murayama
at Hitachi Kenki FineTech Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Electron beams, Edge detection, Electron microscopes, Feature extraction, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Atomic force microscope, Line edge roughness, 3D image processing

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Metrology, Silicon, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Critical dimension metrology, Semiconducting wafers, 3D image processing, Carbon nanotubes

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Mirrors, Metrology, Digital signal processing, Interferometers, Scanners, Atomic force microscopy, Signal processing, Precision measurement, Servomechanisms, 3D scanning

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